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Related Experiment Video

Updated: Aug 24, 2025

Dendrimer-based Uneven Nanopatterns to Locally Control Surface Adhesiveness: A Method to Direct Chondrogenic Differentiation
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Quantification of area-selective deposition on nanometer-scale patterns using Rutherford backscattering spectrometry.

Niels Claessens1,2, Zamran Zahoor Khan3, Negin Rahnemai Haghighi3,4

  • 1IMEC, Kapeldreef 75, 3001, Leuven, Belgium. niels.claessens@imec.be.

Scientific Reports
|October 22, 2022
PubMed
Summary

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This study introduces Rutherford backscattering spectrometry (RBS) for elemental analysis of nano-scale patterns. It quantifies ruthenium deposition selectivity on 35nm SiO2-TiN structures with high sensitivity.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Precise elemental analysis of nanoscale patterns is crucial for advanced manufacturing.
  • Existing methods may lack the sensitivity or site-specificity required for complex nanostructures.
  • Area-selective deposition requires accurate quantification of material distribution at the nanoscale.

Purpose of the Study:

  • To develop and demonstrate a site-specific elemental analysis technique for nano-scale patterns.
  • To quantify the area-selective deposition of ruthenium (Ru) on SiO2-TiN line-space patterns.
  • To achieve high sensitivity and accuracy in elemental analysis of nanostructures.

Main Methods:

  • Utilizing Rutherford backscattering spectrometry (RBS) for data acquisition.

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  • Analyzing large ensembles of identical nanostructures to enhance detection limits.
  • Exploiting ion energy loss effects within nanostructures for depth-resolved analysis.
  • Employing ion-trajectory calculations for spectrum deconvolution.

    • Main Results:

    • Successful site-specific elemental analysis of 35 nm linewidth / 90 nm pitch SiO2-TiN patterns.
    • Quantification of ruthenium selectivity on SiO2 line tops versus sidewalls.
    • Achieved a sensitivity limit of 10^13 atoms/cm^2 for ruthenium detection.
    • Demonstrated quantitative, traceable, and highly accurate analysis.

    Conclusions:

    • RBS is a powerful technique for site-specific elemental analysis of nanostructures.
    • The developed method enables precise quantification of area-selective deposition.
    • This approach is vital for process control and optimization in nanotechnology.