Study of the ordered assembly morphologies of diblock copolymers on the same substrate

Area of Science:

• Materials Science
• Nanotechnology
• Chemical Engineering

Background:

• Block copolymers (BCPs) are crucial for advanced lithography due to their self-assembly (SA) properties.
• Directed self-assembly (DSA) using BCPs is a promising technique for fabricating nanoscale patterns in semiconductor manufacturing.
• Emerging semiconductor processes require innovative lithographic methods for high-resolution pattern definition.

Purpose of the Study:

• To optimize the self-assembly of two distinct block copolymers (BCPs) in thin films.
• To develop an efficient process for integrating BCPs onto topographic guiding substrates fabricated via electron beam lithography (EBL).
• To achieve controlled alignment of BCP morphologies (lamellar and cylindrical) for advanced photolithography applications.

Main Methods:

• Optimization of coating and baking processes for BCP thin films.
• Fabrication of topographic guiding pattern substrates using electron beam lithography (EBL).
• Integration of two BCPs onto a single guiding substrate to direct self-assembly.

Main Results:

• Highly ordered BCP assembly morphologies (cylinder and lamella) were achieved without requiring an additional topcoat layer.
• Specific self-assembly was successfully directed by the topographic guiding substrate.
• Lamellar micro-domains aligned perpendicular to trench edges, and cylindrical micro-domains (PMMA in PS matrix) aligned parallel to trench edges were obtained.

Conclusions:

• An optimal process for BCP self-assembly on topographic guiding substrates was established.
• The study demonstrates the potential of DSA with BCPs for creating precisely aligned nanoscale features essential for next-generation lithography.
• The findings provide valuable insights for the application of BCP self-assembly in advanced electronic devices and semiconductor manufacturing.