Up/Down-Scaling Photoluminescent Micromarks Written in Diamond by Ultrashort Laser Pulses: Optical Photoluminescent...

Elongated photoluminescent micromarks were inscribed inside a IaAB-type natural diamond in laser filamentation regime by multiple 515 nm, 0.3 ps laser pulses tightly focused by a 0.25 NA micro-objective. The micromark length, diameter and photoluminescence contrast scaled as a function of laser pulse energy and exposure, coming to a saturation. Our Raman/photoluminescence confocal microscopy studies indicate no structural diamond damage in the micromarks, shown as the absent Raman intensity variation versus laser energy and exposition along the distance from the surface to the deep mark edge. In contrast, sTable 3NV (N3)-centers demonstrate the pronounced increase (up to 40%) in their 415 nm zero-phonon line photoluminescence yield within the micromarks, and an even higher-ten-fold-increase in NV⁰-center photoluminescence yield. Photogeneration of carbon Frenkel "interstitial-vacancy" (I-V) pairs and partial photolytic dissociation of the predominating 2N (A)-centers were suggested to explain the enhanced appearance of 3NV- and NV-centers, apparently via vacancy aggregation with the resulting N (C)-centers or, consequently, with 2N- and N-centers.