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Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Morphology-Controlled Reststrahlen Band and Infrared Plasmon Polariton in GaN Nanostructures
Krishna Chand Maurya1,2,3, Abhijit Chatterjee1,2,3, Sonnada Math Shivaprasad1,2,3
1Chemistry and Physics of Materials Unit, Jawaharlal Nehru Centre for Advanced Scientific Research, Bangalore560064, India.
Abstract:
Due to ultrabright and stable blue light emission, GaN has emerged as one of the most famous semiconductors of the modern era, useful for light-emitting diodes, power electronics, and optoelectronic applications. Extending GaN's optical resonance from visible to mid- and-far-infrared spectral ranges will enable novel applications in many emerging technologies. Here we show hexagonal honeycomb-shaped GaN nanowall networks and vertically standing nanorods exhibiting morphology-dependent Reststrahlen band and plasmon polaritons that could be harnessed for infrared nanophotonics. Surface-induced dipoles at the edges and asperities in molecular beam epitaxy-deposited nanostructures lead to phonon absorption inside the Reststrahlen band, altering its shape from rectangular to right-trapezoidal. Excitation of such surface polariton modes provides a novel pathway to achieve far-infrared optical resonance in GaN. Additionally, surface defects in nanostructures lead to high carrier concentrations, resulting in tunable mid-infrared plasmon polaritons with high-quality factors. Demonstration of morphology-controlled Reststrahlen band and plasmon polaritons make GaN nanostructures attractive for infrared nanophotonics.

