Adsorption kinetics of NO2 gas on oxyfluorinated graphene film

Vitalii I Sysoev1, Ruslan D Yamaletdinov2, Pavel E Plyusnin1

  • 1Nikolaev Institute of Inorganic Chemistry, Siberian Branch of Russian Academy of Sciences, 3 Acad. Lavrentiev ave., Novosibirsk 630090, Russia. sysoev@niic.nsc.ru.

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