Exceptional Light Sensitivity by Thiol-Ene Click Lithography.

Area of Science:

• Nanotechnology
• Materials Science
• Chemistry

Background:

• Lithographic patterning is crucial for nanoscale fabrication but limited by low energy conversion efficiency.
• Traditional photoresist systems require high exposure doses, hindering throughput.
• Thiol-ene reactions offer high efficiency as a click chemistry process.

Purpose of the Study:

• To introduce a novel click lithography strategy for ultraefficient nanofabrication.
• To leverage the rapid thiol-ene click reaction for improved lithography performance.
• To demonstrate high-contrast and high-resolution patterning with reduced exposure doses.

Main Methods:

• Utilized ultrahigh-functionality material designs.
• Implemented a thiol-ene click reaction-based lithography strategy.
• Tested with deep-ultraviolet (DUV) and electron beam lithography.

Main Results:

• Achieved high-contrast patterning of metal-containing nanoclusters at a low DUV dose (7.5 mJ cm⁻²).
• Demonstrated 10-20 times lower exposure dose compared to photoacid generator systems.
• Fabricated 45 nm dense patterns using electron beam lithography at a low dose.

Conclusions:

• Click lithography offers high sensitivity and resolution for nanofabrication.
• The thiol-ene reaction enables ultraefficient patterning.
• This approach provides inspiration for next-generation lithography designs.