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Carrier Generation and Recombination01:22

Carrier Generation and Recombination

672
Carrier generation is the process by which electron-hole pairs (EHPs) are created within the semiconductor. In direct-bandgap semiconductors, such as gallium arsenide (GaAs), this occurs efficiently when energy absorption prompts valence electrons to leap into the conduction band, leaving behind holes.
This process is given by the generation rate G and is efficient due to the conservation of momentum between the valence band maximum and conduction band minimum.
Indirect generation involves an...
672
Carrier Transport01:21

Carrier Transport

502
The generation of electrical current in semiconductors is fundamentally driven by two mechanisms: drift and diffusion. These processes are essential for the functionality and performance of semiconductor-based devices.
Drift Current:
The drift of charge carriers is started by an external electric field (E). Charged particles, such as electrons and holes, experience an acceleration between collisions with lattice atoms. For electrons, this results in a drift velocity (vd) given by:
502
Types of Semiconductors01:20

Types of Semiconductors

710
Intrinsic semiconductors are highly pure materials with no impurities. At absolute zero, these semiconductors behave as perfect insulators because all the valence electrons are bound, and the conduction band is empty, disallowing electrical conduction. The Fermi level is a concept used to describe the probability of occupancy of energy levels by electrons at thermal equilibrium. In intrinsic semiconductors, the Fermi level is positioned at the midpoint of the energy gap at absolute zero. When...
710
Fermi Level Dynamics01:12

Fermi Level Dynamics

308
The vacuum level denotes the energy threshold required for an electron to escape from a material surface. It is usually positioned above the conduction band of a semiconductor and acts as a benchmark for comparing electron energies within various materials.
Electron affinity in semiconductors refers to the energy gap between the minimum of its conduction band and the vacuum level and it is a critical parameter in determining how easily a semiconductor can accept additional electrons.
The work...
308
P-N junction01:11

P-N junction

600
A p-n junction is formed when p-type and n-type semiconductor materials are joined together. At the interface of the p-n junction, holes from the p-side and electrons from the n-side begin to diffuse into the opposite sides due to the concentration gradient. This diffusion of carriers leads to a region around the junction where there are no free charge carriers, known as the depletion region. The charge density within the depletion region for the n-side and p-side can be described by the...
600
Metal-Semiconductor Junctions01:24

Metal-Semiconductor Junctions

428
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
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Related Experiment Video

Updated: Aug 14, 2025

Carrier Lifetime Measurements in Semiconductors through the Microwave Photoconductivity Decay Method
07:38

Carrier Lifetime Measurements in Semiconductors through the Microwave Photoconductivity Decay Method

Published on: April 18, 2019

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Ultrafast carrier dynamics and layer-dependent carrier recombination rate in InSe.

Ting-Hsuan Wu1,2, Hao-Yu Cheng1,2,3, Wei-Chiao Lai2

  • 1Department of Physics, National Taiwan University, Taipei 106319, Taiwan.

Nanoscale
|January 18, 2023
PubMed
Summary

Indium selenide (InSe) semiconductors exhibit thickness-dependent carrier dynamics. Thinner InSe flakes show faster recombination, influenced by surface conditions and oxidation, impacting device performance.

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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Area of Science:

  • Materials Science
  • Condensed Matter Physics
  • Semiconductor Physics

Background:

  • Indium selenide (InSe) layered semiconductors offer high carrier mobility, presenting advantages over transition-metal dichalcogenides in various device applications.
  • Understanding carrier dynamics, particularly near bandgaps, is crucial for fundamental knowledge and enhancing device performance.

Purpose of the Study:

  • To investigate the ultrafast carrier dynamics in exfoliated InSe.
  • To determine the influence of photocarriers on the optical bandgap.
  • To analyze the effect of thickness and surface conditions on carrier recombination rates.

Main Methods:

  • Ultrafast spectroscopy was employed to study carrier dynamics in exfoliated InSe.
  • A free carrier diffusion model was utilized to extract layer-dependent surface recombination velocities.
  • Exposed and oxidized InSe samples were compared to assess the impact of surface conditions.

Main Results:

  • The presence of photocarriers induced a notable shrinkage in the optical bandgap of InSe.
  • Carrier recombination rates increased with decreasing InSe nanoflake thickness, indicating surface recombination dominance.
  • Oxidation of freshly exfoliated InSe surfaces led to a decrease in carrier recombination rates.

Conclusions:

  • Surface condition and thickness are critical factors governing carrier lifetimes in few-layer InSe.
  • The observed phenomena provide insights into optimizing InSe for advanced electronic and optoelectronic devices.