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Related Experiment Video

Updated: Aug 13, 2025

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates
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Surface functionalization on nanoparticles via atomic layer deposition.

Kun Cao1, Jiaming Cai1, Bin Shan2

  • 1State Key Laboratory of Digital of Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.

Science Bulletin
|January 20, 2023
PubMed
Summary
This summary is machine-generated.

Atomic Layer Deposition (ALD) is a versatile ultrathin film technique. ALD on particles enables conformal, porous, and selective coatings for advanced nanofabrication in energy, catalysis, and environmental applications.

Keywords:
Atomic layer depositionConformal encapsulationPorous coatingSelective decorationSurface functionalization

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Chemical Engineering

Background:

  • Atomic Layer Deposition (ALD) is an ultrathin film preparation method with expanding applications beyond semiconductors.
  • Emerging fields like energy, environment, and catalysis show great interest in ALD-designed thin films.
  • ALD on particles represents a significant advancement in nanofabrication.

Purpose of the Study:

  • To explore the design, preparation, and characterization of ALD thin films on particles.
  • To highlight pioneering applications of ALD on particles, including conformal, porous, and selective coatings.
  • To demonstrate the potential of ALD for atomic-scale surface functionalization of particles.

Main Methods:

  • Conformal encapsulation of particles using ALD to protect them from environmental erosion.
  • Development of porous ALD coatings to expose particle surfaces while creating nanopores.
  • Application of selective ALD for precise control over surface modification and defect passivation on particles.

Main Results:

  • ALD enables conformal coating for particle protection, preserving original material properties.
  • Porous ALD coatings offer advantages in modifying electrode materials, catalysis, and energy applications.
  • Selective ALD allows for precise, directional surface functionalization and facet passivation.

Conclusions:

  • ALD on particles opens new avenues for advanced nanofabrication and material design.
  • ALD techniques provide practical strategies for atomic-scale, precise surface functionalization of particles.
  • These advancements significantly expand the potential applications of ALD in various scientific and industrial fields.