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Updated: Aug 13, 2025

A Technique to Functionalize and Self-assemble Macroscopic Nanoparticle-ligand Monolayer Films onto Template-free Substrates
Published on: May 9, 2014
Kun Cao1, Jiaming Cai1, Bin Shan2
1State Key Laboratory of Digital of Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
Atomic Layer Deposition (ALD) is a versatile ultrathin film technique. ALD on particles enables conformal, porous, and selective coatings for advanced nanofabrication in energy, catalysis, and environmental applications.
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