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High Energy Storage Performance of PZO/PTO Multilayers via Interface Engineering
Yuanyuan Zhang1,2, Qianqian Chen1, Ruijuan Qi1
1Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Science, School of Physics and Electronic Science, East China Normal University, Shanghai200241, People's Republic of China.
Abstract:
Antiferroelectric thin-film capacitors with ultralow remanent polarization and fast discharge speed have attracted extensive attention for energy storage applications. A multilayer heterostructure is considered to be an efficient approach to enhance the breakdown strength and improve the functionality. Here, we report a high-performance multilayer heterostructure (PbZrO3/PbTiO3) with a maximum recoverable energy storage density of 36.4 J/cm3 due to its high electric breakdown strength (2.9 MV/cm) through the heterostructure strategy. The positive effect of interfacial blockage and the negative effect of local strain defects competitively affect the breakdown strength, showing an inflection point at n = 3. The atomic-scale characterizations reveal the underlying microstructure mechanism of the interplay between the heterointerface dislocations and the decreased energy storage performance. This work offers the potential of well-designed multilayers with high energy storage performance through heterostructure engineering.
