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Error analysis and realization of a phase-modulated diffraction grating used as a displacement sensor.

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    |March 2, 2023
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    This study introduces a new phase-modulated diffraction grating (PMDG) design that significantly improves energy efficiency for displacement measurements. The novel design also demonstrates high tolerance to manufacturing errors, simplifying fabrication.

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    Area of Science:

    • Optics and Photonics
    • Nanotechnology and Micromachining
    • Metrology and Measurement Science

    Background:

    • Grating-based interferometric cavities offer compact and accurate displacement measurement solutions.
    • Phase-modulated diffraction gratings (PMDGs) enhance energy utilization and sensitivity by minimizing zeroth-order beams.
    • Conventional PMDGs face manufacturing challenges due to stringent submicron feature requirements.

    Purpose of the Study:

    • To develop a hybrid error model for analyzing the impact of fabrication errors on PMDG optical performance.
    • To design and experimentally validate a process-tolerant PMDG for improved manufacturability.
    • To quantify the performance improvements and error tolerance of the novel PMDG design.

    Main Methods:

    • Establishment of a hybrid error model incorporating etching and coating errors for a four-region PMDG.
    • Experimental fabrication of the designated process-tolerant PMDG using micromachining techniques.
    • Grating-based displacement measurements utilizing an 850 nm laser to verify the model and grating performance.

    Main Results:

    • The PMDG achieved a nearly 500% improvement in energy utilization coefficient and a four-fold reduction in zeroth-order beam intensity compared to traditional gratings.
    • The developed PMDG exhibits high tolerance to fabrication errors, with acceptable etching and coating errors up to 0.5 µm and 0.6 µm, respectively.
    • Experimental verification confirmed the validity of the hybrid error model and the effectiveness of the process-tolerant grating.

    Conclusions:

    • The hybrid error model provides a quantitative understanding of fabrication errors' influence on PMDG optical responses.
    • The process-tolerant PMDG design offers a viable and manufacturable alternative for grating-based displacement measurement devices.
    • This research facilitates the fabrication of diffraction elements within practical micromachining limitations.