Relationship between low-frequency electromagnetic field and computer vision syndrome

This study aimed to determine the prevalence of computer vision syndrome (CVS) among secretaries working in different departments of a university hospital in Turkey and its relationship with low-frequency electromagnetic field (LF-EMF) exposure.

This cross-sectional study included 143 secretaries working in different departments of the hospital. Besides eye examinations, CVS Syndrome Questionnaire (CVS-Q) Scale and Ocular Surface Disease Index Scale (OSDI) were applied to the participants. LF-EMF of the work environment were measured with a 6010 Gauss/Teslameter device and the light intensity with an LX-1102 Device.

The mean age of participants was 39.6 years, with a male-to-female ratio of 25.2% to 74.8%. CVS-Q scale revealed 83.9% of computer vision syndrome among participants. A weak positive correlation was found between CVS-Q and LF-EMF, while a moderately strong, negative correlation was found between LF-EMF and Schirmer test of both eyes. The work environment LF-EMF values were significantly higher among the participants diagnosed with CVS (p<0.05). The risk of CVS was found to increase 3.27 times when the ambient LF-EMF was >1,725 µT and an increase of 0.004 units in the CVS-Q score was calculated for each one-unit increase in the LF-EMF of the environment.

A relationship between CVS, dry eye and EMF was observed among people exposed to LF-EMF. Regular measurement of EMF in work environments, and developing protective behaviours (work-break intervals, 20-20-20 rule, etc.) can be recommended.