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Optimizing Electromagnetic Interference Shielding of Ultrathin Nanoheterostructure Textiles through Interfacial

Song Zhang1, Chongjie Wang2, Tenghua Gao1,3

  • 1State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China.

ACS Applied Materials & Interfaces
|March 20, 2023
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Summary

This study presents a novel Ni/SiC/carbon cloth nanoheterostructure for electromagnetic interference (EMI) shielding. The material achieves excellent shielding effectiveness with a thin profile, overcoming limitations of traditional EMI shielding textiles.

Keywords:
EMI shielding textileSchottky contactSiC nanowhiskersinterfacial engineeringnanoheterostructure

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Electromagnetics

Background:

  • Electromagnetic interference (EMI) shielding textiles face challenges with reflection loss and pollution.
  • Developing thin, highly effective EMI shielding composites remains difficult.
  • Interfacial engineering offers a promising strategy to enhance EMI shielding properties.

Purpose of the Study:

  • To fabricate a novel nanoheterostructure for improved EMI shielding.
  • To investigate the effect of interfacial engineering on electromagnetic wave absorption and reflection.
  • To develop thin, flexible, and stable EMI shielding materials.

Main Methods:

  • Fabrication of Ni nanoparticle/SiC nanowhisker/carbon cloth nanoheterostructure using laser chemical vapor deposition (LCVD).
  • Direct growth of SiC nanowhiskers on carbon cloth.
  • Construction of Ni/SiC interface to form Schottky contact.

Main Results:

  • The Ni/SiC interface promotes interfacial polarization and enhances dielectric loss.
  • The nanoheterostructure effectively absorbs electromagnetic waves while suppressing reflection.
  • Achieved an EMI shielding effectiveness of 68.6 dB at a thickness of 0.39 mm.
  • Demonstrated high flexibility and long-term stability.

Conclusions:

  • Interfacial engineering via Schottky contact formation is effective for enhancing EMI shielding.
  • The developed Ni/SiC/carbon cloth exhibits superior EMI shielding performance.
  • The material shows significant potential for advanced EMI shielding applications.