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Published on: May 17, 2024
2D Bi2Te3/Si heterostructure with high thermoelectric power factor enabled by interface regulated carrier injection
Lili Chen1, Beibei Zhu1, Jiayi Chen1
1School of Materials Science and Engineering, Jiangsu Key Laboratory of Advanced Metallic Materials, Southeast University, Nanjing 211189, People's Republic of China.
Optimizing charge carrier concentration in 2D bismuth telluride (Bi2Te3) via 2D Bi2Te3/Si heterostructures significantly enhances thermoelectric performance. Tuning the silicon substrate
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Optimizing charge carrier concentration in 2D bismuth telluride (Bi2Te3) is crucial for advancing thermoelectric performance.
- Existing methods often face limitations in achieving the desired charge carrier levels for efficient energy conversion.
Purpose of the Study:
- To investigate the impact of interfacial electronic band structure engineering in 2D Bi2Te3/Si heterostructures.
- To enhance the thermoelectric properties of 2D Bi2Te3 by optimizing charge carrier concentration through substrate modification.
Main Methods:
- Fabrication of 2D Bi2Te3/Si heterostructures using varying silicon substrates with different work functions.
- Characterization of interfacial electronic band structure and measurement of thermoelectric properties, including electrical conductivity and Seebeck coefficient.
Main Results:
- Decreasing the work function of the Si substrate from 4.6 to 4.06 eV led to simultaneous increases in charge carrier concentration and electron effective mass.
- Electrical conductivity of 2D Bi2Te3 on n++-Si reached 1250 S·cm-1, a 90% improvement over the SiO2/Si counterpart, with a Seebeck coefficient of -103 μV·K-1.
- The 2D Bi2Te3/n++-Si heterostructure achieved a power factor of 13.4 μW·cm-1·K-2, demonstrating state-of-the-art performance.
Conclusions:
- Interfacial engineering in 2D Bi2Te3/Si heterostructures provides an effective strategy for optimizing thermoelectric properties.
- Tuning the substrate's work function is a facile method to enhance charge carrier concentration and improve the overall thermoelectric performance of 2D materials.
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