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Updated: Aug 5, 2025
Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene
Published on: July 3, 2015
CALPHAD-Based Modelling of the Temperature-Composition-Structure Relationship during Physical Vapor Deposition of
Philipp Keuter1,2, Moritz To Baben1, Shamsa Aliramaji2
1GTT-Technologies, Kaiserstraße 103, 52134 Herzogenrath, Germany.
Abstract:
The temperature-dependent composition and phase formation during the physical vapor deposition (PVD) of Mg-Ca thin films is modeled using a CALPHAD-based approach. Considering the Mg and Ca sublimation fluxes calculated based on the vapor pressure obtained by employing thermochemical equilibrium calculations, the experimentally observed synthesis-temperature trends in the thin-film composition and phase formation were reproduced. The model is a significant step towards understanding how synthesis parameters control composition and, therefore, phase formation in the PVD of metals with high vapor pressures.
