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Controlling Hot Charge Carrier Transfer in Monolithic AlSiAl Heterostructures for Plasmonic On-Chip Energy
Zehao Song1, Masiar Sistani1, Fabian Schwingshandl1
1Institute of Solid State Electronics, Technische Universität Wien, Gußhausstraße 25-25a, Vienna, 1040, Austria.
Abstract:
The generation of hot carriers by Landau damping or chemical interface damping of plasmons is of particular interest to the fundamental aspects of extreme light-matter interactions. Hot charge carriers can be transferred to an attached acceptor for photochemical or photovoltaic energy conversion. However, these lose their excess energy and relax to thermal equilibrium within picoseconds and it is difficult to extract useful work thereof with thermodynamic efficiencies that are of interest for practical devices. Without a detailed understanding of the underlying plasmon decay processes and transfer mechanisms, proper material matching and design considerations for novel plasmonic devices are extremely challenging. Here, a multifunctional AlSiAl heterostructure device with tunable Schottky barriers is presented to control plasmon-induced hot carrier injection at an abrupt metal-semiconductor interface. Light absorption, surface plasmon generation, and separation of hot carriers arising from the non-radiative decay of surface plasmons are realized in a monolithic Schottky barrier field effect transistor. Aside from barrier modulation, a virtual p-n junction can be emulated in the semiconductor channel with the distinct merit that carrier concentration and polarity are tunable by electrostatic gating. The investigations are carried out with a view to possible use for CMOS-compatible plasmonic photovoltaics, with versatile implementations for autonomous nanosystems.
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