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Advanced Algorithm for Reliable Quantification of the Geometry and Printability of Printed Patterns.
1Department of Advanced Components and Materials Engineering, Sunchon National University, 255 Jungang-ro, Suncheon 57922, Republic of Korea.
Nanomaterials (Basel, Switzerland)
|May 27, 2023
Summary
This study presents a new algorithm for precisely measuring printed pattern dimensions and printability, crucial for electronic devices. The developed method aids in establishing international standards for pattern quality evaluation.
Area of Science:
- Materials Science
- Electrical Engineering
- Metrology
Background:
- Printability of nanoparticle-based patterns is critical for electronic device performance.
- Existing methods lack standardized, precise measurements for pattern dimensions and printability.
- Need for international standards in evaluating printed shape patterns.
Purpose of the Study:
- To introduce an advanced algorithm for accurate measurement of printed shape pattern geometry and printability.
- To lay the groundwork for establishing international standards for pattern dimensions and printability.
- To enable comprehensive analysis of pattern deviations like edge waviness and widening.
Main Methods:
- Algorithm development focusing on edge extraction, pixel identification, and reference edge fitting.
- Calculation of edge pixel deviations relative to best-fit reference edges.
- Comprehensive analysis considering all pixels along pattern edges.
Main Results:
- Demonstrated accurate measurement of pattern geometry and printability, including edge waviness and widening.
- Quantified average widening of 3.55% and maximum deviation of 1.58% for rectangle and circle patterns.
- Validated algorithm performance using an average of 1662 data points per pattern.
Conclusions:
- The developed algorithm offers precise measurement of printed pattern characteristics.
- Potential applications include real-time quality control and AI-driven process optimization.
- Provides a foundation for International Electrotechnical Commission (IEC) standards for shape patterns.
