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Interface-Engineered Organic Near-Infrared Photodetector for Imaging Applications
Abu Bakar Siddik1,2, Epimitheas Georgitzikis1, Yannick Hermans1
1IMEC, Kapeldreef 75, 3001 Leuven, Belgium.
ACS Applied Materials & Interfaces
|June 16, 2023
Summary
We developed a high-speed near-infrared organic photodetector (OPD) with significantly reduced dark current using amorphous indium gallium zinc oxide. This advancement enables high-quality imaging applications.
Area of Science:
- Materials Science
- Optoelectronics
- Semiconductor Physics
Background:
- Organic photodetectors (OPDs) are crucial for near-infrared (NIR) imaging.
- Achieving low dark current and high speed in OPDs remains a challenge.
- Understanding dark current mechanisms is key to device optimization.
Purpose of the Study:
- To develop a high-speed, low dark current NIR organic photodetector (OPD).
- To elucidate the dominant dark current mechanism in the OPD.
- To demonstrate the potential of the improved OPD in imaging applications.
Main Methods:
- Fabrication of OPDs on silicon substrates using amorphous indium gallium zinc oxide (a-IGZO) as the electron transport layer (ETL).
- Characterization using temperature-dependent current-voltage measurements, Q-DLTS, transient photovoltage decay, and ultraviolet photoelectron spectroscopy.
- Introduction of an interfacial layer to mitigate dark current.
Main Results:
- Identified trap-assisted field-enhanced thermal emission (Poole-Frenkel emission) as the primary dark current mechanism.
- Achieved a significantly reduced dark current of 125 pA/cm² at -1 V reverse bias by introducing an interfacial layer.
- Obtained fast photo response times of 639 ns (rise) and 1497 ns (fall).
Conclusions:
- The developed interfacial layer effectively suppresses dark current in NIR OPDs.
- The high-speed, low dark current OPDs are suitable for advanced imaging systems.
- Integration with CMOS read-out circuits demonstrates practical applicability for high-quality imaging.
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