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Metrological Comparison of Available Methods to Correct Edge-Effect Local Plasticity in Instrumented Indentation Test
Jasurkhuja Kholkhujaev1,2, Giacomo Maculotti1, Gianfranco Genta1
1Department of Management and Production Engineering, Politecnico di Torino, Corso Duca degli Abruzzi 24, 10129 Turin, Italy.
Materials (Basel, Switzerland)
|June 28, 2023
Summary
Instrumented Indentation Test (IIT) corrections for material plasticity are compared using a novel metrological framework. The Nix-Gao model offers the highest accuracy, while electrical contact resistance (ECR) provides the best precision for real-time analysis.
Area of Science:
- Materials Science
- Mechanical Engineering
- Metrology
Background:
- Instrumented Indentation Test (IIT) is crucial for material characterization across scales.
- Material plasticity at indentation edges introduces significant biases in IIT results.
- Existing correction methods lack comprehensive metrological performance comparisons.
Purpose of the Study:
- To introduce a metrological framework for comparing IIT plasticity correction methods.
- To evaluate the accuracy and uncertainty of various correction techniques.
- To identify the most suitable methods for different applications.
Main Methods:
- Literature review of existing IIT plasticity correction methods.
- Development and application of a metrological comparison framework.
- Evaluation of work-based, topographical, Nix-Gao, and electrical contact resistance (ECR) approaches.
- Comparison using calibrated reference materials for traceability.
Main Results:
- The Nix-Gao model demonstrated the highest accuracy (0.28 GPa) with an expanded uncertainty of 0.57 GPa.
- The ECR approach exhibited the highest precision (0.33 GPa accuracy, 0.37 GPa expanded uncertainty).
- ECR enables practical in-line and real-time material characterization.
Conclusions:
- A novel metrological framework facilitates objective comparison of IIT correction methods.
- The Nix-Gao model is recommended for high-accuracy material characterization.
- ECR is the preferred method for applications requiring real-time, in-line analysis and high precision.

