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Multi-functional dual-path self-aligned polarization interference lithography.

Jiaqi Song, Baolei Liu, Xuchen Shan

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    This study introduces dual-path self-aligned polarization interference lithography (Dp-SAP IL) for precise nanostructure fabrication. The Dp-SAP IL method achieves high-steepness, uniform periodic nanostructures and tunable quasicrystals with high contrast interference fringes.

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    Area of Science:

    • Nanotechnology
    • Optics
    • Materials Science

    Background:

    • Accurate manufacturing of nanostructures with sharp features is crucial for advanced lithography.
    • Existing interference lithography methods face challenges in achieving high steepness and uniform nanostructures.

    Purpose of the Study:

    • To demonstrate a novel dual-path self-aligned polarization interference lithography (Dp-SAP IL) technique.
    • To enable the fabrication of high-steepness, uniform periodic nanostructures and quasicrystals with adjustable rotation symmetry.
    • To investigate the influence of polarization states and incident angles on interference contrast.

    Main Methods:

    • Utilizing a dual-path self-aligned polarization interference lithography (Dp-SAP IL) system.
    • Employing transverse electric (TE) wave illumination to achieve high interference contrast.
    • Experimentally fabricating diffraction gratings with periods from 238.3 nm to 851.6 nm.

    Main Results:

    • Achieved high-steepness (greater than 85 degrees) and high-uniformization in fabricated nanostructures.
    • Demonstrated high interference contrast (minimum 0.9328) independent of incident angles due to self-aligned polarization.
    • Successfully manufactured quasicrystals with adjustable rotation symmetry and structure colors.

    Conclusions:

    • The Dp-SAP IL technique offers a cost-effective method for fabricating nanostructures with precise control over polarization.
    • The method enables the creation of complex nanostructures like quasicrystals and structure colors with high fidelity.
    • This approach has significant potential for advancing nanolithography and materials manufacturing.