Active Probe Atomic Force Microscopy with Quattro-Parallel Cantilever Arrays for High-Throughput Large-Scale Sample...

Area of Science:

• Materials Science and Engineering
• Nanotechnology
• Metrology

Background:

• Atomic Force Microscopy (AFM) is crucial for nanoscale surface imaging but limited by low throughput for large-area inspection.
• Existing high-speed AFMs sacrifice imaging area for dynamic process visualization.
• Inspecting large nanofabricated structures demands high spatial resolution and productivity over extensive areas.

Purpose of the Study:

• To develop a high-throughput AFM system capable of large-scale nanoscale imaging.
• To overcome the throughput limitations of conventional single-cantilever AFMs.
• To enable efficient metrological data acquisition for industrial inspection applications.

Main Methods:

• Utilized an array of active cantilevers with integrated piezoresistive sensors and thermomechanical actuators for parallel imaging.
• Implemented large-range nano-positioners and advanced control algorithms for individual cantilever operation.
• Employed data-driven post-processing for image stitching and automated defect detection.

Main Results:

• Demonstrated simultaneous multi-cantilever operation, significantly increasing imaging throughput.
• Successfully captured nanoscale 3D topography images of silicon gratings, pyrolytic graphite, and EUV lithography masks.
• Showcased the potential for stitching multiple images to cover large areas with high resolution.

Conclusions:

• The developed active cantilever array AFM offers a viable solution for high-throughput, large-scale nanoscale imaging.
• This technology can be integrated for metrological data acquisition in diverse applications, including EUV mask inspection and semiconductor manufacturing.
• Further engineering integration promises enhanced capabilities for advanced industrial inspection needs.