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Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns
Hanna Ohlin1, Thomas Frisk1, Ulrich Vogt1
1Department of Applied Physics, Biomedical and X-ray Physics, KTH Royal Institute of Technology, Albanova University Center, 106 91 Stockholm, Sweden.
Micromachines
|July 8, 2023
Summary
This study presents a simplified lift-off process using CSAR62 resist for creating dense gold nanostructures. This method enhances nanofabrication for applications like metal-assisted chemical etching.
Area of Science:
- Nanofabrication
- Materials Science
- Lithography
Background:
- Lift-off processing is crucial for pattern transfer in nanofabrication.
- Chemically amplified and semi-amplified resist systems expand electron beam lithography capabilities.
Purpose of the Study:
- To report a reliable and simple lift-off process for dense nanostructured patterns.
- To demonstrate a streamlined method for defining gold nanostructures using CSAR62 resist.
Main Methods:
- Utilized a single layer of CSAR62 resist for pattern definition.
- Employed electron beam lithography for high-resolution patterning.
- Developed a lift-off process for gold nanostructures on silicon substrates.
Main Results:
- Achieved a reliable and simple lift-off process for dense nanostructures.
- Demonstrated pattern definition for varied feature sizes up to 10 nm thick gold layers.
- Successfully fabricated gold nanostructures suitable for metal-assisted chemical etching.
Conclusions:
- The CSAR62-based lift-off process offers a simplified pathway for dense nanostructure fabrication.
- The developed process is effective for creating gold nanostructures for advanced applications.
- This technique broadens the scope of nanofabrication using electron beam lithography.
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