Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Co-Evaporated Ratio-Tunable Te<sub>x</sub>Se<sub>1-x</sub> Film for High-Performance Multiband Photodetection Toward Subretinal Color Visual Functions.

Small (Weinheim an der Bergstrasse, Germany)·2026
Same author

In Situ Au Nanoparticle Decorated Multilayer PdSe<sub>2</sub> Films for Enhanced Bolometric Photodetection.

ACS applied materials & interfaces·2026
Same author

Flicker-Suppressed Neuromorphic Unit for Dynamic Vision Processing.

ACS nano·2026
Same author

Hydrophilic Substrates: A Key toward Wrinkle-Free Wet Transfer of Two-Dimensional Materials.

ACS applied materials & interfaces·2026
Same author

In-material physical computing based on reconfigurable microwire arrays via halide-ion segregation.

Nature communications·2025
Same author

Tunable Bipolar Photothermoelectric Response from Mott Activation for In-Sensor Image Preprocessing.

Advanced materials (Deerfield Beach, Fla.)·2025

Related Experiment Video

Updated: Jul 22, 2025

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
06:21

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

2.9K

Genetic algorithm-based optical proximity correction for DMD maskless lithography.

Zhuojun Yang, Jie Lin, Liwen Liu

    Optics Express
    |July 21, 2023
    PubMed
    Summary
    This summary is machine-generated.

    A new genetic algorithm optical proximity correction (OPC) method improves digital micromirror device (DMD) maskless lithography. This technique enhances pattern fidelity by up to 20%, optimizing microfabrication processes.

    More Related Videos

    Patterned Photostimulation with Digital Micromirror Devices to Investigate Dendritic Integration Across Branch Points
    09:30

    Patterned Photostimulation with Digital Micromirror Devices to Investigate Dendritic Integration Across Branch Points

    Published on: March 2, 2011

    15.7K
    Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography
    11:05

    Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography

    Published on: October 25, 2018

    7.5K

    Related Experiment Videos

    Last Updated: Jul 22, 2025

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
    06:21

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

    Published on: January 25, 2021

    2.9K
    Patterned Photostimulation with Digital Micromirror Devices to Investigate Dendritic Integration Across Branch Points
    09:30

    Patterned Photostimulation with Digital Micromirror Devices to Investigate Dendritic Integration Across Branch Points

    Published on: March 2, 2011

    15.7K
    Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography
    11:05

    Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography

    Published on: October 25, 2018

    7.5K

    Area of Science:

    • Microfabrication
    • Optical Engineering
    • Computational Lithography

    Background:

    • Optical proximity effects cause pattern distortion in lithography.
    • Digital micromirror device (DMD) maskless lithography offers flexibility but faces pattern fidelity challenges.

    Purpose of the Study:

    • To develop and evaluate a genetic algorithm-based optical proximity correction (OPC) method.
    • To reduce pattern distortion induced by optical proximity effects in DMD maskless lithography.
    • To enhance the fidelity and efficiency of microfabrication using DMD technology.

    Main Methods:

    • Implemented a genetic algorithm for pixel-level grayscale modulation of the mask.
    • Applied the algorithm-assisted OPC to optimize initial mask patterns.
    • Conducted experimental validation using actual exposure tests.

    Main Results:

    • Achieved significant enhancement of the exposure pattern.
    • Increased the matching rate between the final exposure pattern and the mask pattern by up to 20%.
    • Demonstrated applicability to complex masks, showing universality for pattern optimization.

    Conclusions:

    • The algorithm-assisted OPC is effective in mitigating pattern distortion in DMD maskless lithography.
    • The developed method offers a pathway to high-fidelity and efficient microfabrication.
    • This approach holds promise for advanced mask pattern optimization in lithographic processes.