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The Diffusion of Passive Tracers in Laminar Shear Flow
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Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a

Jänis Järvilehto1, Jorge A Velasco1, Jihong Yim1

  • 1Department of Chemical and Metallurgical Engineering, School of Chemical Engineering, Aalto University, P.O. Box 16100, FI-00076 AALTO, Finland. janis.jarvilehto@aalto.fi.

Physical Chemistry Chemical Physics : PCCP
|August 18, 2023
PubMed

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