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Study on ZrSi2 as a Candidate Material for Extreme Ultraviolet Pellicles.

Seong Ju Wi1,2, Won Jin Kim1,2, Haneul Kim1,2

  • 1Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea.

Membranes
|August 25, 2023
PubMed
Summary

Zirconium disilicide (ZrSi2) thin films show promise as extreme ultraviolet (EUV) pellicles. Fabricated pellicles achieved high EUV transmittance and low reflectivity, meeting critical requirements for semiconductor manufacturing.

Keywords:
EUV pellicleEUV reflectivityEUV transmittanceemissivityultimate tensile strengthzirconium silicide (ZrSi2)

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Area of Science:

  • Materials Science
  • Optical Engineering
  • Semiconductor Manufacturing

Background:

  • Extreme ultraviolet (EUV) pellicles are crucial for protecting masks from contamination during semiconductor lithography.
  • Pellicles require high EUV transmittance, low reflectivity, and excellent thermomechanical stability.
  • Increasing EUV source power necessitates advanced pellicle materials.

Purpose of the Study:

  • To determine optimal optical constants for EUV pellicles through simulation.
  • To evaluate zirconium disilicide (ZrSi2) as a candidate material for EUV pellicles.
  • To fabricate and characterize a ZrSi2-based EUV pellicle composite.

Main Methods:

  • Optical simulations to identify ideal optical constants.
  • Co-sputtering technique for depositing ZrSi2 thin films.
  • Experimental evaluation of thermal, optical, and mechanical properties.

Main Results:

  • ZrSi2 was identified as a suitable material based on simulations.
  • A ZrSi2 pellicle composite was successfully fabricated.
  • Measured EUV transmittance of 92.7% and reflectivity of 0.033% were achieved.
  • Ultimate tensile strength reached 3.5 GPa.

Conclusions:

  • ZrSi2 thin films meet the stringent optical and mechanical requirements for EUV pellicles.
  • The fabricated ZrSi2 pellicle demonstrates high performance and applicability.
  • This material offers a viable solution for advanced EUV lithography mask protection.