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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
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Balance between the diffraction efficiency and process robustness for plasmonic lithographic alignment technology

Zhen Song, Libin Zhang, Shang Yang

    Applied Optics
    |September 14, 2023
    PubMed
    Summary

    Plasmonic lithography uses silver films to create a Fabry-Perot resonator, enhancing alignment signals by optimizing film thickness. However, thickness fluctuations challenge alignment accuracy, necessitating careful control for robust performance.

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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Traditional lithography faces limitations in achieving high resolution.
    • Plasmonic lithography introduces metal films to manipulate light-matter interactions.
    • Silver films in a stack can form a Fabry-Perot resonator, influencing light behavior.

    Purpose of the Study:

    • To investigate the impact of metal films on plasmonic lithography alignment signals.
    • To quantitatively analyze diffraction light properties using thin film models.
    • To explore methods for enhancing alignment signal quality and understanding its sensitivity.

    Main Methods:

    • Established a thin film Fourier transfer model to calculate diffraction light amplitude and phase.
    • Utilized the transfer matrix method to compute probe light incidence and reflection.
    • Employed the finite-difference time-domain method to simulate alignment performance.

    Main Results:

    • Optimizing film stack thickness enhances diffraction optical power, increasing wafer quality by up to 25.7%.
    • The Fabry-Perot resonator's phase oscillation amplification effect is key to signal enhancement.
    • Photoresist thickness fluctuations significantly impact moiré fringes, posing challenges for alignment.

    Conclusions:

    • A balance between diffraction efficiency and process robustness is achievable by controlling Fabry-Perot resonator thickness.
    • Metal-insulator-metal structures exhibit high thickness sensitivity, suitable for optical sensing.
    • This research offers insights into optimizing plasmonic lithography for advanced applications.