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Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools.

Zhiyuan Niu, Sikun Li, Yang Liu

    Applied Optics
    |September 14, 2023
    PubMed
    Summary
    This summary is machine-generated.

    A new rigorous simulation model for double-Ronchi shearing interferometry was developed. This accurate model considers light

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    Area of Science:

    • Optical Metrology
    • Lithography Systems

    Background:

    • Double-Ronchi shearing interferometry is crucial for wavefront aberration measurements in advanced lithography projection lenses.
    • Accurate simulation models are essential for designing phase-shifting retrieval algorithms and performing error analysis in lithography.

    Purpose of the Study:

    • To present a rigorous simulation model for double-Ronchi shearing interferometry.
    • To account for the vector nature of light within the simulation.

    Main Methods:

    • Development of a rigorous simulation model for double-Ronchi shearing interferometry.
    • Incorporation of the vector nature of light into the simulation.

    Main Results:

    • A rigorous simulation model for double-Ronchi shearing interferometry has been successfully developed.
    • The model accurately represents the interferometry process, considering the vector nature of light.

    Conclusions:

    • The presented rigorous simulation model is accurate and suitable for studying double-Ronchi shearing interferometry.
    • This model serves as a critical foundation for advancements in lithography tool metrology and error analysis.