Effect of microfluidic channel integration onto gold microelectrode on its redox electrochemistry

Microfluidic systems have attracted significant interest in recent years as they are extensively employed in lab-on-chip and organ-on-chip research. Their combination with electrochemical platforms offers many advantages, promising a high potential for sensing applications, still the microfluidic-channel integration onto electrodes might induce challenges related to changes in signal-to-noise ratios and mass transport conditions. In this study, we investigated the effect of microfluidic channel integration in redox behavior of thermally deposited gold thin film microelectrodes by voltammetric (CV and SWV) electrochemical measurements. Using different dimensions of PDMS microfluidic channels (i.e. widths of 50, 100, 250, and 500 μm) and a constant electrode dimension (200 μm), we analyzed the relationship between altered electroactive area and electrochemical response against target redox molecules. The increases in electroactive area which were determined by the microfluidic channel sizes were in well-correlation with the obtained CV and SWV redox currents as expected. There was no significant decrease in signal-to-noise ratio in microchannel-integrated electrodes. AFM and SEM characterization demonstrated that thermally deposited thin film electrodes had significantly lower (approximately 25 fold) surface roughness in comparison to commercial screen-printed electrodes. Additionally, we have observed a clear microelectrode-to-macroelectrode transition, from hemispherical to linear (planar) diffusion in other terms, with the increasing channel size.