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Updated: Jul 13, 2025

Covalent Attachment of Single Molecules for AFM-based Force Spectroscopy
Published on: March 16, 2020
Saumya Satyarthy1, Md Hasan Ul Iqbal1, Fairoz Abida2
1Department of Chemistry and Biochemistry, The University of Alabama, Tuscaloosa, AL 35487, USA.
Stearic acid (SA) shows promise as an area-selective atomic layer deposition (AS-ALD) blocking layer. This study reveals SA monolayers effectively inhibit ZnO ALD growth on Co and Cu, crucial for advanced chip manufacturing.
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