Related Experiment Video
Updated: Jul 11, 2025

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Important aspects of investigating optical excitations in semiconductors using a scanning transmission electron
Michael Stöger-Pollach1,2, Krýstina Bukvišova3, Keanu Zenz2
1University Service Center for TEM, TU Wien, Vienna, Austria.
Abstract:
Since semiconductor structures are becoming smaller and smaller, the examination methods must also take this development into account. Optical methods have long reached their limits here, but small dimensions are also a challenge for electron beam techniques, especially when it comes to determining optical properties. In this paper, electron microscopic methods of investigating optical properties are discussed. Special attention is given to the physical limits and how to deal with them. We will cover electron energy loss spectrometry as well as cathodoluminescence spectrometry. We pay special attention to inelastic delocalisation, radiation damage, the Čerenkov effect, interference effects of optical excitations and higher diffraction orders on a grating analyser for the cathodoluminescence signal.
Related Concept Videos
Scanning Electron Microscopy
Fundamental Principles
Accelerated...
Overview of Electron Microscopy
Transmission Electron Microscopy
Overview of Microscopy Techniques
Preparation of Samples for Electron Microscopy

