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Quantification of Unsupported Thin-Film X-ray Spectra Using Bulk Standards.

Nicholas W M Ritchie1, Andrew Herzing1, Vladimir P Oleshko1

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Microscopy and Microanalysis : the Official Journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
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PubMed
Summary

This study introduces a new quantification model for analyzing thin films using X-ray spectra. The model accurately determines the composition and mass thickness of single-layer and multilayer films, enhancing material analysis.

Keywords:
NIST DTSA-II softwareSTEM-in-SEMbulk standardsenergy-dispersive spectrometry (EDS)quantitative electron-excited X-ray microanalysisthicknessthin films

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Area of Science:

  • Materials Science
  • Analytical Chemistry
  • Physics

Background:

  • Accurate quantification of thin films is crucial for material characterization.
  • Existing methods may face challenges with multilayer structures and elemental overlap.
  • Standard X-ray spectra from bulk materials offer a potential resource for improved analysis.

Purpose of the Study:

  • To present a novel multivariate quantification model for determining the composition and mass thickness of unsupported thin films.
  • To extend the model's applicability to both single-layer and multilayer thin film systems.
  • To leverage bulk material X-ray spectra for enhanced accuracy in thin film analysis.

Main Methods:

  • Development of a multivariate iterative model utilizing standard X-ray spectra from bulk materials.
  • Application of the model to single-layer films where each element has at least one characteristic X-ray line.
  • Extension of the model to multilayer films, accommodating elements associated with single layers or multiple layers with additional data.

Main Results:

  • The quantification model successfully determines composition and mass thickness for single and multilayer thin films.
  • The model effectively handles peak interferences in thin-film spectra using bulk standard spectra, particularly in energy-dispersive X-ray spectrometry.
  • The algorithm's performance is supported by experimental data and Monte Carlo simulations.

Conclusions:

  • The presented quantification model provides a robust method for analyzing thin film composition and mass thickness.
  • The model's flexibility and accuracy are demonstrated for various thin film configurations, including complex multilayer systems.
  • The integration of the algorithm into the National Institute of Standards and Technology DTSA-II software facilitates its widespread application in materials research.