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Related Experiment Video

Updated: Jul 11, 2025

Fabrication And Characterization Of Photonic Crystal Slow Light Waveguides And Cavities
11:08

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Published on: November 30, 2012

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Dielectric optical waveguide fabricated on a transparent substrate.

Jiaqi Yuan, Rifat A Aoni, Andrea M Armani

    Optics Letters
    |November 15, 2023
    PubMed
    Summary

    Electron beam lithography on transparent substrates is improved using a chromium conductive layer. This method enables precise, large-scale fabrication of photonic devices, overcoming previous charge-related patterning issues.

    Area of Science:

    • Materials Science
    • Nanotechnology
    • Photonics

    Background:

    • Transparent substrates are crucial for metasurfaces, AR/VR, and holographic devices.
    • Electron beam lithography on these substrates suffers from charge buildup, causing field distortion and stitching errors.
    • Existing conductive polymer layers are insufficient for high-voltage electron beam lithography requiring nano-features.

    Purpose of the Study:

    • To develop a reliable method for charge-free electron beam lithography on transparent substrates.
    • To enable high-resolution, large-area patterning for advanced photonic devices.
    • To overcome limitations of current charge mitigation techniques.

    Main Methods:

    • A chromium (Cr) overcoating conductive layer was applied to the resist on transparent substrates.

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  • Electron beam lithography was performed using this Cr layer to mitigate charging effects.
  • The technique was validated by fabricating on-chip silicon nitride (Si3N4) waveguides on silicon dioxide (SiO2).

    • Main Results:

    • Accurate and seamless patterning was achieved across multiple writing fields.
    • The chromium layer effectively suppressed charge buildup during high-voltage electron beam lithography.
    • Successful fabrication of integrated photonic components was demonstrated.

    Conclusions:

    • Chromium overcoating is a viable solution for high-resolution electron beam lithography on transparent substrates.
    • This technique facilitates the fabrication of large-scale integrated photonic systems.
    • It offers a pathway to advance the manufacturing of complex optical devices.