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Editorial for the Special Issue on Magnetic and Spin Devices, Volume II
Viktor Sverdlov1, Seung-Bok Choi2,3
1Christian Doppler Laboratory for Nonvolatile Magnetoresistive Memory and Logic, Institute for Microelectronics, TU Wien, 1040 Vienna, Austria.
Micromachines
|November 25, 2023
Summary
Miniaturization of metal-oxide-semiconductor field-effect transistors (MOSFETs) faces challenges. These issues in complementary metal-oxide-semiconductor (CMOS) device scaling are nearing saturation, impacting integrated circuit advancements.
Area of Science:
- Semiconductor device physics
- Integrated circuit technology
- Materials science
Background:
- Miniaturization of metal-oxide-semiconductor field-effect transistors (MOSFETs) has driven integrated circuit (IC) advancements.
- Continued scaling of MOSFETs is crucial for enhancing speed, performance, density, and complexity of modern ICs.

