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Method for testing freeform surfaces based on a Shack-Hartmann sensor with plane wavefront scanning and stitching.

Jing Wang, Xiaokun Wang, Lirong Peng

    Optics Express
    |November 29, 2023
    PubMed
    Summary

    This study introduces a new method for measuring freeform surfaces using a Shack-Hartmann wavefront sensor. The Shack-Hartmann wavefront sensor with subaperture stitching (SHPSS) method enhances both accuracy and dynamic range for precise surface error measurement.

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    Area of Science:

    • Optical Engineering
    • Metrology
    • Surface Science

    Background:

    • Freeform surfaces present challenges in measurement due to the trade-off between accuracy and dynamic range.
    • Existing surface error measurement technologies struggle to meet the demands for both high precision and broad measurement capability.

    Purpose of the Study:

    • To develop a non-null testing method for freeform surfaces that overcomes the limitations of current technologies.
    • To improve the dynamic range and measurement accuracy for freeform surface error assessment.

    Main Methods:

    • Utilizing a Shack-Hartmann wavefront sensor with a scanning technique for stitching (SHPSS).
    • Developing a mathematical model based on ray tracing and reflection theorem for accurate point calculation.
    • Implementing an iterative algorithm for wavefront aberration calculation and sampling point refinement.

    Main Results:

    • SHPSS demonstrated increased dynamic range and improved wavefront reconstruction accuracy.
    • Achieved a measurement accuracy of 11.45 nm for full aperture freeform surfaces.
    • Experimental results on a 100 mm freeform mirror showed RMS errors less than λ/30, with repeatability accuracy better than 1/80 λ.

    Conclusions:

    • The SHPSS method offers a feasible and effective solution for high-accuracy freeform surface testing.
    • The developed technique significantly enhances the capabilities for measuring complex optical surfaces.
    • SHPSS provides a robust approach for advancing metrology in optical manufacturing and research.