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Related Experiment Video

Updated: Jul 9, 2025

High-resolution Patterning Using Two Modes of Electrohydrodynamic Jet: Drop on Demand and Near-field Electrospinning
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Large area structural color printing based on dot-matrix laser interference patterning.

Maria Shishova, Artem Solomashenko, Dmitry Lushnikov

    Optics Express
    |November 29, 2023
    PubMed
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    This study introduces a new dot-matrix method for creating large-area Optically Variable Devices (OVDs), enhancing anti-counterfeiting security features. The improved technique offers a faster, simpler alternative to existing technologies for producing vibrant, dynamic visual effects.

    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Security Technology

    Background:

    • Optically Variable Devices (OVDs) are crucial for anti-counterfeiting, offering dynamic color effects.
    • Current methods for large-area OVD production face efficiency challenges.
    • Plasmonic OVDs are desirable for advanced security features.

    Purpose of the Study:

    • To develop a modified dot-matrix approach for efficient, large-area manufacturing of plasmonic OVDs.
    • To investigate the impact of fabrication parameters on OVD performance.
    • To present a faster, simpler alternative to electron-beam lithography for OVD production.

    Main Methods:

    • Utilized dot-matrix technology, a standard security hologram origination technique.
    • Adjusted spatial filters to double the resolution of quasi-sinusoidal diffraction gratings.

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  • Experimentally created diffraction gratings with frequencies from 1600 to 3500 lines/mm.

    • Main Results:

    • Successfully produced plasmonic zero-order spectral filters.
    • Demonstrated the influence of grating geometry, silver thickness, and light incidence/polarization on transmission characteristics.
    • Achieved 1D or 2D structural color OVD images over several square centimeters.
    • Recorded elements at high speeds, with exposure times from 120-400 ms per frame.

    Conclusions:

    • The modified dot-matrix method enables efficient, large-area production of high-resolution plasmonic OVDs.
    • This technique offers a significant speed and simplicity advantage over electron-beam lithography.
    • The developed OVDs are suitable for advanced anti-counterfeiting applications.