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Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone

Kristjan Kalam1, Peeter Ritslaid1, Tanel Käämbre1

  • 1Institute of Physics, University of Tartu, W. Ostwaldi 1, 50411 Tartu, Estonia.

Beilstein Journal of Nanotechnology
|November 29, 2023
PubMed

Keywords:
atomic layer depositiontin oxidetin tetraiodide

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