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Plasmonic Titanium Nitride Nanohole Arrays for Refractometric Sensing.
Beyza Nur Günaydın1,2, Mert Gülmez1, Milad Torabfam1,2
1Faculty of Engineering and Natural Sciences, Sabanci University, Tuzla, Istanbul 34956, Turkey.
ACS Applied Nano Materials
|December 1, 2023
Summary
Titanium nitride (TiN) thin films were optimized for plasmonic applications using sputtering. TiN nanohole arrays show promise for refractometric sensing, offering tunable optical properties and stability.
Area of Science:
- Materials Science
- Nanotechnology
- Optics
Background:
- Group IVB metal nitrides are explored as alternative plasmonic materials.
- Titanium nitride (TiN) offers advantages like stability, CMOS-compatibility, and tunable properties over traditional plasmonics.
- TiN's potential for refractometric sensing is investigated.
Purpose of the Study:
- To optimize the deposition of plasmonic titanium nitride (TiN) thin films.
- To fabricate and characterize TiN nanohole arrays for plasmonic applications.
- To evaluate the efficacy of TiN for refractometric sensing.
Main Methods:
- Reactive RF magnetron sputtering was used to deposit TiN thin films.
- Optimization of Ar/N2 flow rates and oxygen scavenging.
- Electron beam lithography and reactive ion etching for nanohole array fabrication.
- Microspectroscopy was employed to analyze reflection and transmission characteristics.
Main Results:
- Optimized TiN thin films with improved plasmonic performance were achieved.
- Stoichiometry and structure were analyzed to validate deposition procedures.
- TiN nanohole arrays demonstrated tunable optical responses in different media.
Conclusions:
- Optimized TiN thin films are suitable for plasmonic applications.
- TiN nanohole arrays exhibit potential for refractometric sensing.
- TiN offers a stable and tunable platform for optical sensing applications.
