Compact snapshot dual-mode interferometric system for on-machine measurement.

Area of Science:

• Optical engineering
• Metrology
• Surface characterization

Background:

• On-machine metrology is crucial for efficient optical manufacturing.
• Simultaneous surface shape and roughness measurement presents challenges.
• Existing systems may lack compactness or simplicity.

Purpose of the Study:

• To propose a compact, dual-mode interferometric system for on-machine metrology.
• To simplify the measurement of both surface shape and roughness.
• To enhance the capability for surface characterization in optical manufacturing.

Main Methods:

• A novel optical filter design separates reference arm beams for dual-mode operation.
• A pixelated camera with a micro-polarizer array captures simultaneous phase-shifted interferograms.
• Configuration-optimization-based subaperture stitching extends the measurable aperture.

Main Results:

• The proposed system successfully performs simultaneous surface shape and roughness measurements.
• Numerical analysis and experimental validation confirm system feasibility.
• The system demonstrates portability and suitability for on-machine applications.

Conclusions:

• The compact snapshot dual-mode interferometer offers a powerful tool for optical manufacturing.
• It enables on-machine surface characterization over diverse spatial frequencies and aperture sizes.
• This system addresses the need for efficient and versatile metrology in optical production.