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Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled
S Chouteau1,2, L Stafford2, A Granier1
1Nantes Université, CNRS, Institut des Matériaux de Nantes Jean Rouxel, IMN, F-44000 Nantes, France.
Langmuir : the ACS Journal of Surfaces and Colloids
|February 4, 2024
Summary
Using more volatile solvents in misty plasma processes creates smaller droplets, leading to better nanoparticle dispersion in thin films. This overcomes nanoparticle accumulation issues for improved coating quality.
Area of Science:
- Materials Science
- Plasma Physics
- Nanotechnology
Background:
- Misty plasma processes show promise for thin film deposition using colloidal solutions.
- Nanoparticle accumulation in ring structures hinders the creation of high-quality coatings with uniform nanoparticle distribution.
Purpose of the Study:
- To investigate methods for controlling droplet size in spray processes for uniform nanoparticle dispersion.
- To identify the mechanism responsible for improved nanoparticle dispersion when using more volatile solvents.
Main Methods:
- Experimental investigation of colloidal droplet behavior on substrates.
- Development and application of a one-dimensional evaporation model.
- Analysis of nanoparticle dispersion in plasma-deposited nanocomposite films.
Main Results:
- Utilizing more volatile solvents results in finer droplets on the substrate.
- Improved nanoparticle dispersion within the matrix was observed with finer droplets.
- Faster evaporation during droplet transport in plasma was ruled out as the primary cause.
Conclusions:
- Controlling solvent volatility is key to managing droplet size and enhancing nanoparticle dispersion.
- A 'flash' boiling atomization mechanism is proposed to explain the observed improvements in nanoparticle distribution.
- This research offers a pathway to synthesize high-quality nanocomposite films with uniform nanoparticle content.
