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Related Concept Videos

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

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In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then...
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Inductively coupled plasma–mass spectrometry (ICP–MS) is a highly selective and sensitive technique for accurate elemental analysis. Though the analysis of ICP–MS mass spectra is comparatively straightforward, it is affected by spectroscopic and non-spectroscopic interferences. Spectroscopic interferences arise when the plasma contains ionic species with an m/z value the same as the analyte ion. Spectroscopic interference can be categorized as isobaric, polyatomic ions, and...
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Basic Research in Plasma Medicine - A Throughput Approach from Liquids to Cells
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In-plasma analysis of plasma-surface interactions.

P Vinchon1, S Asadollahi2, C Coté2

  • 1Université de Montréal, Montréal, Québec H3C 3J7, Canada.

The Review of Scientific Instruments
|December 8, 2023
PubMed
Summary
This summary is machine-generated.

A new system monitors plasma-surface interactions using ion beams and in-situ characterization tools. This enables real-time analysis of materials processing, crucial for thin films and nanomaterials.

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Area of Science:

  • Materials Science
  • Plasma Physics
  • Surface Science

Background:

  • Simultaneous interactions of reactive species (neutrals, ions, electrons, photons) occur during plasma processing of thin films and nanomaterials.
  • Transient species present during plasma phases complicate monitoring of plasma-surface interactions.
  • Real-time characterization is essential for understanding and controlling plasma-based materials modification.

Purpose of the Study:

  • To develop and present a novel system for in-situ monitoring of plasma-surface interactions.
  • To integrate multiple characterization techniques for comprehensive analysis during plasma processing.
  • To provide time-resolved data on materials modification induced by plasma species.

Main Methods:

  • A combined system featuring neutral atom beams, positive ion beams, UV photons, and a magnetron plasma source.
  • In-plasma surface characterization using Rutherford Backscattering Spectrometry (RBS), Elastic Recoil Detection (ERD), and Raman spectroscopy.
  • Utilizing a 1.7 MV ion beam line Tandetron accelerator for RBS/ERD at grazing incidence and Raman spectroscopy via an optical port.

Main Results:

  • The system enables real-time monitoring of atomic concentrations (stoichiometry, impurities) using ion beam analysis during deposition or etching.
  • Raman spectroscopy tracks spectral evolution, offering insights into defect generation by low-energy ions in materials like graphene.
  • Simultaneous application of multiple probes provides unique time-resolved information on plasma-induced modifications.

Conclusions:

  • The developed system offers a powerful platform for real-time, in-situ characterization of plasma-surface interactions.
  • This integrated approach enhances understanding of materials processing dynamics in thin films and nanomaterials.
  • The capability to monitor atomic composition and structural changes provides critical data for optimizing plasma-based fabrication.