Biasing of FET
Field Effect Transistor
MOSFET
MOSFET: Enhancement Mode
Metal-Semiconductor Junctions
Characteristics of JFET
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Updated: Jul 2, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Chong-Myeong Song1, Dongha Kim2, Shinbuhm Lee2
1Department of Electrical Engineering and Computer Science, Daegu Gyeongbuk Institute of Science and Technology (DGIST), Daegu, 42988, South Korea.
Researchers developed a 2D ferroelectric field-effect transistor (FeFET) using HfZrO2 and 2D semiconductors. This device shows promise for advanced neuromorphic systems, mimicking synaptic functions and achieving high accuracy in pattern recognition.
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