Related Experiment Video
Updated: Jul 2, 2025

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Transparent Structures for ZnO Thin Film Paper Transistors Fabricated by Pulsed Electron Beam Deposition
Florin Gherendi1, Daniela Dobrin1, Magdalena Nistor1
1National Institute for Lasers, Plasma and Radiation Physics (INFLPR), P.O. Box MG-36, 077125 Magurele-Bucharest, Romania.
Abstract:
Thin film transistors on paper are increasingly in demand for emerging applications, such as flexible displays and sensors for wearable and disposable devices, making paper a promising substrate for green electronics and the circular economy. ZnO self-assembled thin film transistors on a paper substrate, also using paper as a gate dielectric, were fabricated by pulsed electron beam deposition (PED) at room temperature. These self-assembled ZnO thin film transistor source-channel-drain structures were obtained in a single deposition process using 200 and 300 µm metal wires as obstacles in the path of the ablation plasma. These transistors exhibited a memory effect, with two distinct states, "on" and "off", and with a field-effect mobility of about 25 cm2/Vs in both states. For the "on" state, a threshold voltage (Vth on = -1.75 V) and subthreshold swing (S = 1.1 V/decade) were determined, while, in the "off" state, Vth off = +1.8 V and S = 1.34 V/decade were obtained. A 1.6 μA maximum drain current was obtained in the "off" state, and 11.5 μA was obtained in the "on" state of the transistor. Due to ZnO's non-toxicity, such self-assembled transistors are promising as components for flexible, disposable smart labels and other various green paper-based electronics.

