MOSFET: Enhancement Mode
Biasing of Metal-Semiconductor Junctions
Biasing of FET
Metal-Semiconductor Junctions
MOS Capacitor
MOSFET
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Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Yuqing Zhou1,2, Chao Yang1, Xingke Fu3
1Center for Spintronics and Quantum Systems, State Key Laboratory for Mechanical Behavior of Materials, Department of Materials Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China.
Interface doping controls ferroelectric polarization using ultraviolet light in MoTe2/BaTiO3/La0.7Sr0.3MnO3 heterostructures. Thickness-dependent doping leads to opposite polarization switching, advancing nanoelectronic and optoelectronic devices.
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