Dual-wavelength Fourier ptychographic microscopy for topographic measurement

Topographic measurements of micro- or nanostructures are essential in cutting-edge scientific disciplines such as optical communications, metrology, and structural biology. Despite the advances in surface metrology, measuring micron-scale steps with wide field of view (FOV) and high-resolution remains difficult. This study demonstrates a dual-wavelength Fourier ptychographic microscopy for high-resolution topographic measurement across a wide FOV using an aperture scanning structure. This structure enables the capture of a three-dimensional (3D) sample's scattered field with two different wavelength lasers, thus allowing the axial measurement range growing from nano- to micro-scale with enhanced lateral resolution. To suppress the unavoidable noises and artifacts caused by temporal coherence, system vibration, etc., a total variation (TV) regularization algorithm is introduced for phase retrieval. A blazed grating with micron-scale steps is used as the sample to validate the performance of our method. The agreement between the high-resolution reconstructed topography with our method and that with atomic force microscopy verified the effectiveness. Meanwhile, numerical simulations suggest that the method has the potential to characterize samples with high aspect-ratio steps.