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Published on: April 24, 2018
On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering
Jiewen Li1,2, Wanxin Li1,2, Yang Feng1,2
1State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China.
Abstract:
The intriguing and anomalous optical characteristics of exceptional points (EPs) in optical resonators have attracted significant attention. While EP-related phenomena have been observed by perturbing resonators with off-chip components, implementing EPs fully on-chip remains challenging due to their extreme susceptibility to fabrication errors. In this Letter, we propose a succinct and compact approach to reach EP in an on-chip integrated silicon microring resonator by manipulating the evolution of backscatterings with two nanocylinders of disparate diameters. The theoretical analysis unveils that the fabrication constraints could be significantly relieved by increasing the difference in diameters of the nanocylinders. The evolution from non-EP to EP is traced experimentally through the step-by-step tuning of the angular and radial positions of nanocylinders. The proposed method opens a pathway toward the on-chip high-density integration of non-Hermitian devices.
