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Published on: April 24, 2018
On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering.
Jiewen Li1,2, Wanxin Li1,2, Yang Feng1,2
1State Key Laboratory on Tunable Laser Technology, Guangdong Provincial Key Laboratory of Integrated Photonic-Electronic Chip, Guangdong Provincial Key Laboratory of Aerospace Communication and Networking Technology, Harbin Institute of Technology, Xili University Town, Harbin Institute of Technology campus, Shenzhen, Guangdong 518055, China.
Researchers demonstrate a compact on-chip method to achieve exceptional points (EPs) in silicon microring resonators. This approach enhances fabrication tolerance, paving the way for integrated non-Hermitian photonic devices.
Area of Science:
- Photonics
- Nanotechnology
- Optical Engineering
Background:
- Exceptional points (EPs) in optical resonators exhibit unique optical properties.
- On-chip implementation of EPs is difficult due to sensitivity to fabrication errors.
Purpose of the Study:
- To propose a compact, on-chip method for achieving EPs in silicon microring resonators.
- To overcome fabrication challenges in realizing on-chip EPs.
Main Methods:
- Utilizing two nanocylinders of different diameters to manipulate backscattering.
- Theoretical analysis and experimental tracing of the evolution from non-EP to EP states.
Main Results:
- A succinct and compact on-chip approach to reach EPs was developed.
- Increased diameter difference in nanocylinders significantly relieves fabrication constraints.
- Experimental demonstration of tuning EP states by adjusting nanocylinder positions.
Conclusions:
- The proposed method offers a viable pathway for on-chip EP realization.
- This work facilitates high-density integration of non-Hermitian photonic devices.
- The approach enhances robustness against fabrication imperfections.
