Using the Spark Plasma Sintering System for Fabrication of Advanced Semiconductor Materials

Area of Science:

• Materials Science
• Chemical Engineering
• Solid State Physics

Background:

• Spark Plasma Sintering (SPS) is a rapidly advancing technique for material processing and synthesis.
• Growing interest necessitates a deeper understanding of SPS processes for broader applications.

Purpose of the Study:

• To present the development of a versatile Spark Plasma Sintering (SPS) device for material processing and synthesis.
• To demonstrate the manufacturing methods and capabilities of the SPS device.
• To expand knowledge regarding the fundamental nature of SPS processes.

Main Methods:

• Development and functional demonstration of a specialized SPS device.
• Processing of Arc-Melted materials (half-Heusler, cobalt triantimonide).
• Synthesis and processing of Self-propagating High-temperature Synthesis (SHS)-synthesized semiconductor materials (bismuth telluride).

Main Results:

• Successful development of an SPS system with enhanced functionality.
• Demonstrated versatility in processing diverse materials, including complex semiconductors.
• Achieved precise design of material sintering processes.

Conclusions:

• The developed SPS device offers significant potential for both scientific research and industrial material synthesis.
• The study enhances the repeatability and accuracy of SPS sintering conditions.
• This work contributes to a broader understanding and application of SPS technology.