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Updated: Jun 29, 2025

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Bingjie Liu1, Xiaofei Yue1, Chenxu Sheng1
1School of Information Science and Technology, Fudan University, Shanghai, 200433, China.
Researchers optimized tungsten diselenide (WSe2) field-effect transistors (FETs) by reducing contact resistance. This breakthrough enhances the performance of 2D electronics for next-generation devices.
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