Multiple Myeloma and Occupational Risk Factors: A Narrative Review

Alireza Hejrati1, Sadaf Parvin2, Mehrnia Omidali2

  • 1Department of Internal Medicine, School of Medicine, Hazrat-e Rasool General Hospital, Iran University of Medical Sciences, Tehran, Iran.

Insights

Occupational exposures like pesticides and asbestos may increase the risk of developing multiple myeloma (MM), a rare cancer. Further research is needed to confirm these links and inform protective measures.

Area of Science:

  • Hematology
  • Environmental Health
  • Occupational Medicine

Background:

  • Multiple Myeloma (MM) is a plasma cell neoplasm linked to bone lesions, anemia, and renal failure.
  • The exact cause of MM remains unknown, but environmental and genetic factors are suspected.
  • Potential occupational risk factors include pesticides, benzene, organic solvents, asbestos, radiation, and wood dust.

Purpose of the Study:

  • To review current research on the association between occupational exposures and Multiple Myeloma.
  • To identify potential environmental risk factors for MM in the workplace.

Main Methods:

  • Literature review of studies investigating occupational exposures and MM.
  • Analysis of existing research on environmental and genetic risk factors for MM.

Main Results:

  • Several occupational agents, including pesticides, benzene, solvents, asbestos, radiation, and wood dust, have been implicated as potential MM risk factors.
  • Current studies often have limited sample sizes and rely on participant recall, complicating definitive risk factor identification.
  • A definitive etiology for MM is yet to be established, necessitating larger-scale investigations.

Conclusions:

  • Recognizing occupational risk factors is crucial for clinicians to advise employees on exposure reduction and implement safety measures.
  • Further large-scale studies are required to establish definitive occupational risk factors for MM.
  • Anticipated future regulations aim to reduce occupational exposure risks associated with MM development.