Study on line-scan profile for a trapezoid line under varying sample temperatures through Monte-Carlo simulation

This study investigates the influence of the sample inherent temperature on the line-scan profile for a silicon trapezoid line with different sidewall angles by Monte-Carlo simulation. This study demonstrates that the profile varies with temperature, particularly focusing on the 'shoulder', which becomes more pronounced with larger sidewall angles. The contrast of the secondary electron profile increases at low primary electron energy but decreases at relatively high PE energy as the temperature rises. The trend of the backscattering electron profile is similar but less noticeable. The underlying mechanism is discussed in detail. This study has potential to provide valuable insights into thermometry in nanostructures using SEMs.