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Probing the Spatial Homogeneity of Exfoliated HfTe5 Films
Maanwinder P Singh1,2, Qingxin Dong3,4, Gen-Fu Chen3,4,5
1Walter Schottky Institute and Physics Department, Technical University of Munich, Am Coulombwall 4a, 85748 Garching, Germany.
Abstract:
In van der Waals materials, external strain is an effective tool to manipulate and control electronic responses by changing the electronic bands upon lattice deformation. In particular, the band gap of the layered transition metal pentatelluride HfTe5 is sufficiently small to be inverted by subtle changes of the lattice parameters resulting in a strain-tunable topological phase transition. In that case, knowledge about the spatial homogeneity of electronic properties becomes crucial, especially for the microfabricated thin film circuits used in typical transport measurements. Here, we reveal the homogeneity of exfoliated HfTe5 thin films by spatially resolved Raman microscopy. Comparing the Raman spectra under applied external strain to unstrained bulk references, we pinpoint local variations of Raman signatures to inhomogeneous strain profiles in the sample. Importantly, our results demonstrate that microfabricated contacts can act as sources of significant inhomogeneities. To mitigate the impact of unintentional strain and its corresponding modifications of the electronic structure, careful Raman microscopy constitutes a valuable tool for quantifying the homogeneity of HfTe5 films and circuits fabricated thereof.

