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Highly Efficient Ultraviolet Third-Harmonic Generation in an Isolated Thin Si Meta-Structure.

Yanhui Deng1, Zhonghong Shi1, Yaqin Zheng1

  • 1State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics, Sun Yat-sen University, Guangzhou, 510275, China.

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|July 8, 2024
PubMed
Summary

This study presents a thin silicon nanostructure for highly efficient third-harmonic generation (THG) in the ultraviolet region. The novel device is significantly thinner than previous nonlinear nanophotonic systems.

Keywords:
confined hybrid anapole modeelectric field enhancementnonlinear opticsslotted silicon disk‐ringthird‐harmonic generation

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Area of Science:

  • Photonics and Nanotechnology
  • Nonlinear Optics
  • Materials Science

Background:

  • Nonlinear nanophotonic devices are crucial for integrated optics, quantum technologies, and nanoscience.
  • Key challenges include enhancing nonlinear efficiency, broadening spectral response, and reducing device thickness.

Purpose of the Study:

  • To develop a thin silicon nanostructure for improved third-harmonic generation (THG) efficiency in the ultraviolet (UV) spectrum.
  • To investigate light-matter interactions at subwavelength scales for advanced photonic device design.

Main Methods:

  • Fabrication of a thin silicon meta-structure.
  • Experimental measurement of third-harmonic generation (THG) efficiency.
  • Characterization of the nanostructure's thickness and spectral response.

Main Results:

  • Achieved a THG efficiency of 10^-5 at 309 nm emission wavelength.
  • The nanostructure is only 100 nm thick, significantly thinner than existing all-dielectric nanosystems.
  • Demonstrated a powerful thin meta-structure for efficient UV THG.

Conclusions:

  • The developed thin silicon meta-structure offers highly efficient THG in the UV region.
  • This work provides insights into subwavelength light-matter interactions.
  • Guides the design and fabrication of future advanced photonic devices.